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Relation between sputtering parameters and optical and electrical properties of Ga doped ITO transparent conductive oxide
(Elsevier Science Bv, Amsterdam, 2015)
A ceramic target with Ga:In:Sn=4:64:32 metal ratio has been sintered and used for RF sputtering process to develop high quality Ga doped ITO (GITO) transparent conductive oxide layers, particularly for photovoltaic ...