TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.
Keywords:
ZnO / TiO2 / thin film / dip-coating / AFM
Source:
Advanced Materials and Processes: Yucomat Ii, 1998, 282-2, 147-152
TY - JOUR
AU - Ignjatović, Nenad
AU - Branković, Zorica
AU - Dramicanin, M
AU - Nedeljković, Jovan M.
AU - Uskoković, D
PY - 1998
UR - http://rimsi.imsi.bg.ac.rs/handle/123456789/43
AB - TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.
PB - Trans Tech Publications Ltd, Durnten-Zurich
T2 - Advanced Materials and Processes: Yucomat Ii
T1 - Preparation of TiO2 and ZnO thin films by dip-coating method
EP - 152
SP - 147
VL - 282-2
DO - 10.4028/www.scientific.net/MSF.282-283.147
ER -
@article{
author = "Ignjatović, Nenad and Branković, Zorica and Dramicanin, M and Nedeljković, Jovan M. and Uskoković, D",
year = "1998",
abstract = "TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.",
publisher = "Trans Tech Publications Ltd, Durnten-Zurich",
journal = "Advanced Materials and Processes: Yucomat Ii",
title = "Preparation of TiO2 and ZnO thin films by dip-coating method",
pages = "152-147",
volume = "282-2",
doi = "10.4028/www.scientific.net/MSF.282-283.147"
}
Ignjatović, N., Branković, Z., Dramicanin, M., Nedeljković, J. M.,& Uskoković, D.. (1998). Preparation of TiO2 and ZnO thin films by dip-coating method. in Advanced Materials and Processes: Yucomat Ii
Trans Tech Publications Ltd, Durnten-Zurich., 282-2, 147-152.
https://doi.org/10.4028/www.scientific.net/MSF.282-283.147
Ignjatović N, Branković Z, Dramicanin M, Nedeljković JM, Uskoković D. Preparation of TiO2 and ZnO thin films by dip-coating method. in Advanced Materials and Processes: Yucomat Ii. 1998;282-2:147-152.
doi:10.4028/www.scientific.net/MSF.282-283.147 .
Ignjatović, Nenad, Branković, Zorica, Dramicanin, M, Nedeljković, Jovan M., Uskoković, D, "Preparation of TiO2 and ZnO thin films by dip-coating method" in Advanced Materials and Processes: Yucomat Ii, 282-2 (1998):147-152,
https://doi.org/10.4028/www.scientific.net/MSF.282-283.147 . .
