Influence of substrate orientation on the morphologyand orientation of LaNiO3 thin films
Apstrakt
LaNiO3 thin films were successfully prepared by a chemical method from citrate precursors. The LNO precursor solution was spin-coated onto Si (100) and Si (111) substrates. To obtain epitaxial or highly oriented films, the deposited layers were slowly heated in a gradient thermal field, with a heating rate of 1 degrees min(-1), and annealed at 700 degrees C. The influence of different substrate orientations on the thin film morphology was investigated using atomic force microscopy and X-ray diffraction analysis. Well-crystallized films with grains aligned along a certain direction were obtained on both substrates. Films deposited on both substrates were very smooth, but with a different grain size and shape depending on the crystal orientation. Films deposited on Si (100) grew in the (110) direction and had elongated grains, whereas those on Si (111) grew in the (211) direction and had a quasi-square grain shape.
Ključne reči:
thin film / microstructure / LaNiO3 / AFMIzvor:
Journal of Microscopy, 2008, 232, 3, 585-588Izdavač:
- Wiley, Hoboken
Finansiranje / projekti:
- Ministry of Science and Environmental Protection of the Republic of SerbiaMinistry of Education, Science & Technological Development, Serbia
DOI: 10.1111/j.1365-2818.2008.02121.x
ISSN: 0022-2720
PubMed: 19094043
WoS: 000261253200029
Scopus: 2-s2.0-57449108088
Institucija/grupa
Institut za multidisciplinarna istraživanjaTY - JOUR AU - Počuča-Nešić, Milica AU - Branković, Zorica AU - Branković, Goran AU - Vasiljević-Radović, Dana PY - 2008 UR - http://rimsi.imsi.bg.ac.rs/handle/123456789/263 AB - LaNiO3 thin films were successfully prepared by a chemical method from citrate precursors. The LNO precursor solution was spin-coated onto Si (100) and Si (111) substrates. To obtain epitaxial or highly oriented films, the deposited layers were slowly heated in a gradient thermal field, with a heating rate of 1 degrees min(-1), and annealed at 700 degrees C. The influence of different substrate orientations on the thin film morphology was investigated using atomic force microscopy and X-ray diffraction analysis. Well-crystallized films with grains aligned along a certain direction were obtained on both substrates. Films deposited on both substrates were very smooth, but with a different grain size and shape depending on the crystal orientation. Films deposited on Si (100) grew in the (110) direction and had elongated grains, whereas those on Si (111) grew in the (211) direction and had a quasi-square grain shape. PB - Wiley, Hoboken T2 - Journal of Microscopy T1 - Influence of substrate orientation on the morphologyand orientation of LaNiO3 thin films EP - 588 IS - 3 SP - 585 VL - 232 DO - 10.1111/j.1365-2818.2008.02121.x ER -
@article{ author = "Počuča-Nešić, Milica and Branković, Zorica and Branković, Goran and Vasiljević-Radović, Dana", year = "2008", abstract = "LaNiO3 thin films were successfully prepared by a chemical method from citrate precursors. The LNO precursor solution was spin-coated onto Si (100) and Si (111) substrates. To obtain epitaxial or highly oriented films, the deposited layers were slowly heated in a gradient thermal field, with a heating rate of 1 degrees min(-1), and annealed at 700 degrees C. The influence of different substrate orientations on the thin film morphology was investigated using atomic force microscopy and X-ray diffraction analysis. Well-crystallized films with grains aligned along a certain direction were obtained on both substrates. Films deposited on both substrates were very smooth, but with a different grain size and shape depending on the crystal orientation. Films deposited on Si (100) grew in the (110) direction and had elongated grains, whereas those on Si (111) grew in the (211) direction and had a quasi-square grain shape.", publisher = "Wiley, Hoboken", journal = "Journal of Microscopy", title = "Influence of substrate orientation on the morphologyand orientation of LaNiO3 thin films", pages = "588-585", number = "3", volume = "232", doi = "10.1111/j.1365-2818.2008.02121.x" }
Počuča-Nešić, M., Branković, Z., Branković, G.,& Vasiljević-Radović, D.. (2008). Influence of substrate orientation on the morphologyand orientation of LaNiO3 thin films. in Journal of Microscopy Wiley, Hoboken., 232(3), 585-588. https://doi.org/10.1111/j.1365-2818.2008.02121.x
Počuča-Nešić M, Branković Z, Branković G, Vasiljević-Radović D. Influence of substrate orientation on the morphologyand orientation of LaNiO3 thin films. in Journal of Microscopy. 2008;232(3):585-588. doi:10.1111/j.1365-2818.2008.02121.x .
Počuča-Nešić, Milica, Branković, Zorica, Branković, Goran, Vasiljević-Radović, Dana, "Influence of substrate orientation on the morphologyand orientation of LaNiO3 thin films" in Journal of Microscopy, 232, no. 3 (2008):585-588, https://doi.org/10.1111/j.1365-2818.2008.02121.x . .