@conference{
author = "Markesevic, Nemanja and Jovanović, Vladimir P. and Žikić, Radomir and Scarpellini, M. and Lucenti, E. and Milani, P. and Srdanov, V. I.",
year = "2011",
abstract = "N,N´-Bis(3-methylphenyl)-N,N’dyphenilbenzidine (TPD) is a hole-transport material used in
electroluminescent devices whose glass transition temperature, Tg, depends on the film thickness.[1] For sufficiently thin films (d<30 nm), dewetting of amorphous TPD films deposited on a on fused silica or an ITO substrate occurs even at room temperature.[2] Following a brief report on increased thermal stability of UV irradiated TPD films,[3] we investigated the underlying mechanism responsible for it. From proton NMR and mass spectrometry measurements, coupled with morphology (AFM) and spectroscopy (UV-VIS) studies, we find that photo-excited TPD species react with oxygen in air. This leads to partially oxidized TPD films whose increased thermal stability we ascribe to stronger hydrogen bonding of photo-oxidized TPD species with hydrophilic substrates.",
publisher = "Institute of physics, Pregrevica 118, Belgrade, Serbia, CIMAINA, Università di Milano, Via Celoria 16, 20133 Milano, Italy, 3 Institute for Terahertz Science and Technology, University of California Santa Barbara, Santa Barbara CA 93106",
journal = "XVIII Symposium on Condensed Matter Physics - SFKM 2011, Belgrade",
title = "Altering Glass Transition of TPD thin Films with UV Light",
pages = "105",
url = "https://hdl.handle.net/21.15107/rcub_rimsi_2163"
}